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Deposition Solutions | ECD Wafer

Wafer Plating - Stratus™ P300

ECD 300 – 200 mm Wafer Processing

Applications

  • Configurable for up to 6 metals
  • UBM/RDL
  • Fan Out
  • RF Filters
  • Power Devices

Features

  • Dual wafer size capability
  • Membrane Cells for long bath stability
  • ShearPlate™ technology for thinnest boundary layer
  • Substrate handling flexibility

Substrates

  • 300 and 200 mm wafers
  • Silicon, eWLB, Bonded, Carrier

Other Products

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Advanced Packaging

Complete portfolio for wafer level and panel level packaging technologies.

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