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LASER1205

ASMPT’s laser-based wafer separation machines are leading in Edge quality with lowest Cost of Ownership based on VI dicing and/or Matrix grooving processes. ASMPT has developed a broad portfolio of options for all models to address the specific challenges of our customer’s markets, both for OSAT and tier1 IDM companies. Our latest released model is G-UV-USP which is used for Grooving applications in the Memory market.

The Platform

The LASER1205 platform is a family of systems specially developed for the separation and/or grooving of semiconductor wafers by means of laser energy. The family contains fully automated systems designed for sustained high quality production in an industrial environment.

The ergonomic design, the user-friendly touch screen display and the ease-of-use allow the operator to control the system easily for a wide variety of products. As the LASER1205 systems meet the industrial standards in accordance with CE regulations, no special precautions nor training are required to safely operate the systems.

Multi-beam Technology

The multi-beam technology of ASMPT ALSI uses a Matrix-DOE to provide a fully optimized process and superior customer value for:

  • Achieving low Heat Affected Zone (HAZ)
  • Achieving low or Zero burr
  • Creating a smooth bottom and steep sidewalls

To discover all about the UV-USP technology, view the video.

Grooving UV-USP Grooving UV Dicing UV UVP Dicing IR
Process Grooving Grooving Dicing & Grooving Dicing
Kerf check "On the Fly" Yes Yes Yes No
Wave length 343 nm 355 nm 355 nm 1064 nm
Pulse length ps/fs ns ns ns
Wafer thickness 60 - 800 µm 60 - 800 µm 20 - 200 µm 50 - 300 µm
Wafer size Up to 12" Up to 12" Up to 12" Up to 12"

Features & Benefits

LASER1205 Grooving UV USP

Best of class Process Quality
  • Process for HP Grooving UV USP wavelength 343 µm; pulse length 0.5 .. 10 ps
  • Production example burr < 1 µm
  • Process depth (w/wo metal) < 1 µm
  • Die strength > 800 MP
  • Process control In-line vision and process parameter logging
Production Scalability
  • Full automated calibration D-DOE set < 1 µm
  • Flexibility up to 8 DOE’s recipe selectable
  • Proven platform concept for last 10 years
Compliant with Production Chain
  • Wafer handling capable of handling wafer thickness down to 80 µm grooved wafers
Competitive CoO
  • Production speed UPH same or better than Grooving UV processes

LASER1205 Grooving UV

Best of class Process Quality
  • Dedicated to HP Grooving UV wavelength 355 µm; pulse length ns range
  • Combined with Multi-Beam concept resulting in nice U-shape grooving profiles
  • Process control in-line vision and process parameter logging
Production Scalability
  • Full automated calibrations accurate trenching and matrix DOE set < 1 µm; power level < 0.1 W; logging;
  • Flexibility up to 8 DOE’s (recipe selectable)
Compliant with Production Chain
  • Wafer handling option to convert accurately between 8" and 12“ frames
  • Cassette load station manual, Automated Material Handling System (AMHS)
  • Factory control SECS/GEM interface
Competitive CoO
  • UPH Gain due to indexing > 20%
  • UPH Gain due to Kerf Check “On-the-Fly” > 25%

LASER1205 Dicing UVP

Best of class Process Quality
  • Dedicated to HP UV Dicing wavelength 355 µm; pulse length 0.5 .. 10 ps
  • Combined with Multi beam concept resulting in low HAZ values (< 3 µm)
  • Process control in-line vision and process parameter logging
Production Scalability
  • Full automated calibrations accurate trenching, line, matrix and V-DOE set < 1 µm; power level < 0.1 W
  • Flexibility up to 8 DOE’s (recipe selectable)
Compliant with Production Chain
  • Wafer handling option to convert accurately between 8" and 12“ frames
  • Cassette load station manual, Automated Material Handling System (AMHS)
  • Factory control SECS/GEM interface
Competitive CoO
  • High speed Full cut process
  • One production step for multi layered wafers (DAF tape; Backside metals; Topside structures)
  • Low consumption of coating

LASER1205 Dicing IR

Best of class Process Quality
  • High power IR Dicing wavelength 1064 µm; pulse length ns range
  • Work horse for GaAs dicing up to 300 µm thickness
  • Die strength enhancement by the patented wet etch post process is very effective to enhance side wall quality and burr removal
Production Scalability
  • Full recipe control for coating, dicing and cleaning
  • Flexibility up to 3 DOE’s (recipe selectable)
Compliant with Production Chain
  • Wafer handling options to convert accurately between 8" and 12“ frames
  • Cassette load station manual, Automated Material Handling System (AMHS)
  • Factory control SECS/GEM interface

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